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ZB 10 - Soft Condensed Matter (R. Holyst)

We are different, but we all do great Science; and we have a lot of fun doing it!
We are different, but we all do great Science; and we have a lot of fun doing it!
We are different, but we all do great Science; and we have a lot of fun doing it!
We are different, but we all do great Science; and we have a lot of fun doing it!
We are different, but we all do great Science; and we have a lot of fun doing it!
We are different, but we all do great Science; and we have a lot of fun doing it!
We are different, but we all do great Science; and we have a lot of fun doing it!
We are different, but we all do great Science; and we have a lot of fun doing it!

Publication

Scattering on triply periodic minimal surfaces - the effect of the topology, Debye-Waller, and molecular form factors

Author(s): Garstecki, P and Holyst, R
Title: Scattering on triply periodic minimal surfaces - the effect of the topology, Debye-Waller, and molecular form factors
Abstract: We compute scattering patterns for four triply periodic surfaces (TPS). minimal-Schwarz P (Im(3) over bar m), Schwarz D-diamond (Pn(3) bar m), Schoen G-gyroid (Ia(3) over bar d), and one nodal S1 (Ia(3) bar d). Simple approximations are adopted to examine the influence the molecular form factor, and the Debye-Waller factor on the pattern. We find that the Debye-Waller factor has a much influence on the scattering intensities of TPS than on the of the lamellar structure consisting of parallel surfaces. is caused by an almost spherelike distribution of normal vectors TPS. We give a simple formula that allows a comparison of the scattering data with the data for the P, D, G mathematical Finally, the spectra of the two surfaces G and S1 of the same group symmetry and different topologies are compared. It is found in the case of the more complex S1 structure the intensities of the two peaks are very small. (C) 2000 American Institute of Physics. [}S0021-9606(00)50633-3].
Pages: 3772-3779
Journal: JOURNAL OF CHEMICAL PHYSICS
Volume: 113
ID: ISI:000088878400035
Year: 2000
DOI: 10.1063/1.1287426